The precise control of feature sizes exhibits great importance in fabricating nanodevices for optoelectronics, plasmonics, meta-optics, and biosciences, just to name a few. Some applications require ...
M. K. Sears, J. Bekaert, B. W. Smith, "Pupil wavefront manipulation for optical nanolithography", Proc. SPIE 8326, (2012) paper M. K. Sears, G. Fenger, J. Mailfert, B ...
Light-induced surface structuring of azobenzene-containing films allows for creation of complex surface relief patterns with varying heights, patterns which would be difficult to create using ...
ESOL has developed a standalone interference extreme ultraviolet (EUV) lithography tool for use in R&D applications. The system, called EMiLE (EUV Micro-interference Lithography Equipment), is primary ...
2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
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